The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Nov. 08, 2005
Babak Heidari, Furulund, SE;
Anette Löfstrand, Lund, SE;
Erik Bolmsjö, Malmö, SE;
Erik Theander, Lund, SE;
Marc Beck, H{hacek over (oo)}r, SE;
Babak Heidari, Furulund, SE;
Anette Löfstrand, Lund, SE;
Erik Bolmsjö, Malmö, SE;
Erik Theander, Lund, SE;
Marc Beck, H{hacek over (oo)}r, SE;
Obducat AB, Malmo, SE;
Abstract
The invention relates to a two-step process for transferring a pattern from a template () to a target surface of a substrate, by creating an intermediate flexible polymer stamp () from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.