Obducat Ab

Erik Theander

Babak Heidari

Marc Beck

Erik Bolmsjö

Anette Löfstrand

Method for transferring a pattern from a template () having a structured surface () to a substrate () carrying a surface layer () of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tby means of a heater device (); and while maintaining said temperature T, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation () for solidifying the layer, and&#x2014;postbaking the layer.

Method for imprint lithography at constant temperature

The invention relates to a two-step process for transferring a pattern from a template () to a target surface of a substrate, by creating an intermediate flexible polymer stamp () from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

Growing community of inventors

Lund, Sweden

Erik Theander