Heeze, Netherlands

Erik Roelof Loopsta


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Erik Roelof Loopsta: A Trailblazer in Innovation

Introduction: Erik Roelof Loopsta is a visionary inventor whose dedication to innovation and relentless pursuit of excellence have solidified his position as a leading figure in the world of inventors. Hailing from Heeze, NL, Loopsta has made significant contributions that continue to inspire future generations of innovators to explore the frontiers of technology and beyond.

Latest Patents: With a notable patent titled "Lithographic apparatus and device manufacturing method," Loopsta has introduced a groundbreaking approach to lithographic technology. The patent involves clamping the mask in a lithographic apparatus on two different sides using thin membranes and specific clamping devices. This innovative method has the potential to revolutionize the manufacturing process of devices, setting new standards in the industry.

Career Highlights: Erik Roelof Loopsta is affiliated with ASML Netherlands B.V., a prominent company in the field of technology and innovation. Through his tenure at ASML, Loopsta has been instrumental in driving forward-thinking initiatives and spearheading groundbreaking projects that push the boundaries of what is achievable in the realm of technology.

Collaborations: Loopsta's collaborations with esteemed colleagues such as Bernardus Antonius Johannes Luttikhuis and Harmen Klaas Van Der Schoot have further enriched his innovative journey. Together, they have exchanged ideas, shared expertise, and worked in harmony to bring forth novel solutions to complex technological challenges.

Conclusion: Erik Roelof Loopsta's legacy as a trailblazer in innovation shines brightly, showcasing his unwavering commitment to excellence and his remarkable ability to transform visionary ideas into tangible realities. His contributions not only benefit the present technological landscape but also serve as a guiding light for aspiring inventors and innovators worldwide, inspiring them to dream big and reach for the stars.

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