The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2008
Filed:
Feb. 14, 2006
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Erik Roelof Loopsta, Heeze, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Fransicus Mathijs Jacobs, Asten, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Erik Roelof Loopsta, Heeze, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Fransicus Mathijs Jacobs, Asten, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.