Erik Roelo Loopstra

Erik Roelof Loopstra is a Dutch inventor who has made major contributions to the field of lithography. He currently resides in Heeze, Netherlands, where he has amassed an impressive portfolio of 316 patents.

One of Loopstra's latest patents is for a lithographic apparatus that involves a heater. The apparatus is designed to fill the space between the projection system and the substrate with liquid. The system also has a barrier member to contain the liquid and a heater to regulate the temperature.

Another innovation from Loopstra is a system that projects a beam of radiation onto a substrate within the lithographic apparatus. It includes a radiation source equipped with a grating structure that suppresses the zeroth order of the reflected radiation for at least a first component wavelength. The grating structure has a periodic profile with regularly spaced structures, providing three surface levels. The radiation diffracted by the grating structure includes radiation of three phases that destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength.

Loopstra has worked for numerous companies over the course of his career, including ASML Netherlands B.V. and ASML Holding N.V.. He has collaborated with other notable inventors, such as Johannes Catharinus Hubertus Mulkens and Bob Streefkerk.

Loopstra's contributions to the field of lithography have been invaluable, and his impressive patent portfolio is a testament to his dedication to innovation. With his continued efforts, he is sure to leave an enduring mark on the industry.