The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Feb. 19, 2009
Johannes Hubertus Josephina Moors, Helmond, NL;
Norbertus Benedictus Koster, Delft, NL;
Erik Roelo Loopstra, Eindhoven, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Antonius Theodorus Wilhelmus Kempen, 's-Hertogenbosch, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Norbertus Benedictus Koster, Delft, NL;
Erik Roelo Loopstra, Eindhoven, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Antonius Theodorus Wilhelmus Kempen, 's-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.