This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Fujifilm Corporation, Fujifilm Manufacturing Europe B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2026
Title: The Innovations of Erik Antonius Maria Vermeer
Introduction
Erik Antonius Maria Vermeer is a notable inventor based in Tilburg, Netherlands. He has made significant contributions to the field of gas separation technologies. His innovative work has led to the development of a unique gas separation membrane that showcases his expertise and creativity.
Latest Patents
Vermeer holds a patent for a gas separation membrane that consists of multiple layers. The design includes a support layer, a buffer layer, a discriminating layer, and optional layers of fluorinated polymer and protection. The buffer and discriminating layers are particularly noteworthy, as they incorporate specific metal or metalloid groups that enhance the membrane's functionality. This invention is a testament to his ability to combine scientific principles with practical applications.
Career Highlights
Throughout his career, Vermeer has worked with prominent companies in the industry. He has been associated with Fujifilm Manufacturing Europe B.V. and Fujifilm Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
One of his notable collaborators is Yujiro Itami. Their partnership has likely fostered the exchange of ideas and expertise, further enhancing the quality of their work.
Conclusion
Erik Antonius Maria Vermeer is a distinguished inventor whose contributions to gas separation technologies are noteworthy. His patent for a gas separation membrane exemplifies his innovative spirit and dedication to advancing the field. His collaborations and career experiences continue to shape his impactful work in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile