The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Jun. 14, 2022
Applicants:

Fujifilm Manufacturing Europe B.v., Tilburg, NL;

Fujifilm Corporation, Tokyo, JP;

Inventors:
Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); B01D 67/00 (2006.01); B01D 69/10 (2006.01); B01D 69/12 (2006.01); B01D 71/70 (2006.01); C08L 83/04 (2006.01);
U.S. Cl.
CPC ...
B01D 71/70 (2013.01); B01D 53/228 (2013.01); B01D 67/0006 (2013.01); B01D 67/00791 (2022.08); B01D 69/105 (2013.01); B01D 69/12 (2013.01); B01D 69/127 (2013.01); C08L 83/04 (2013.01); B01D 2256/245 (2013.01); B01D 2257/504 (2013.01); B01D 2323/12 (2013.01);
Abstract

A gas separation membrane comprising the following layers: (i) a support layer; (ii) a buffer layer; (iii) a discriminating layer; (iv) optionally a fluorinated polymer layer; and (v) optionally a protective layer; wherein: (a) the buffer layer (ii) and the discriminating layer (iii) each independently comprise groups of Formula (1): M-(O—)Formula (1) wherein: each M independently is a metal or metalloid atom; O is an oxygen atom; and each x independently has a value of at least 4; (b) the buffer layer (ii) comprises a surface comprising 4 to 10 atomic % of M of Formula (1) groups, wherein M is as hereinbefore defined; (c) the discriminating layer (iii) comprises a surface comprising more than 10 atomic % of M of Formula (1) groups, wherein M is as hereinbefore defined; and (d) layer (ii) is located between layers (i) and (iii).


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