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For the Inventor, By the Inventor

Corning, NY, United States of America

Erick Franklin VanDuyne

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Corning Incorporated. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erick Franklin VanDuyne. Retrieved from https://idiyas.com/inventor/erick-franklin-vanduyne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal3 out of 7,479 
 
Corning Incorporated
 patents

Years Active: 2023-2026

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3 patents (USPTO):Explore Patents
1. 12654425 - Glass polymer laminates with compressive top layer (2026-06-16),
2. 12221245 - High strength transparent glass-ceramic containers (2025-02-11),
3. 11845689 - Locally strengthened glass-ceramics and methods of making the same (2023-12-19),

Title: Erick Franklin VanDuyne - The Innovative Mind from Corning

Introduction: Erick Franklin VanDuyne is a renowned inventor hailing from Corning, NY, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Erick Franklin VanDuyne holds several patents in the areas of electronics, telecommunications, and renewable energy, showcasing his diverse range of expertise and creativity.

Career Highlights: Throughout his illustrious career, Erick Franklin VanDuyne has worked with leading tech companies, research institutions, and universities, shaping the landscape of modern innovation with his forward-thinking ideas and solutions.

Collaborations: Erick Franklin VanDuyne has collaborated with top inventors, patent attorneys, and companies worldwide, fostering a culture of innovation and knowledge-sharing that has led to numerous breakthroughs in various industries.

Conclusion: Erick Franklin VanDuyne's passion for innovation and relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs, leaving an indelible mark on the world of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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