Jersey City, NJ, United States of America

Erica Sherman

This inventor holds 3 USPTO granted patents. Top assignee: Bmic LLC. Active years: 2022-2025.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Erica Sherman: Innovator in Roofing Technology

Introduction

Erica Sherman is a notable inventor based in Jersey City, NJ (US). She has made significant contributions to the field of roofing technology, holding a total of 3 patents. Her innovative designs focus on enhancing the functionality and safety of roofing systems.

Latest Patents

One of Erica's latest patents is a steep slope roofing system. This invention relates to a roofing system that comprises at least one steep slope roof substrate with a first region. The first region includes a plurality of shingles, each containing at least one antimicrobial agent. Additionally, the roofing system features a second region that includes an antimicrobial scavenger layer. This layer is designed to receive runoff from the first region, which may contain an initial concentration of antimicrobial agents and water. The scavenger layer effectively captures the antimicrobial agent, reducing its concentration in the runoff.

Career Highlights

Erica has been instrumental in advancing roofing technology through her innovative designs. Her work at Bmic LLC has allowed her to focus on developing solutions that address common issues in roofing systems. Her patents reflect her commitment to improving building materials and ensuring safety.

Collaborations

Erica collaborates with her coworker, Ming Shiao, to further enhance their projects and drive innovation within their company.

Conclusion

Erica Sherman is a pioneering inventor whose work in roofing technology has led to significant advancements in the industry. Her contributions are shaping the future of roofing systems and improving safety standards.

Profile summary based on public USPTO records.
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