The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

Oct. 20, 2022
Applicant:

Bmic Llc, Dallas, TX (US);

Inventors:

Ming Shiao, Basking Ridge, NJ (US);

Erica Sherman, Jersey City, NJ (US);

Assignee:

BMIC LLC, Dallas, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
E04D 1/30 (2006.01); E04D 1/22 (2006.01); E04D 13/00 (2006.01);
U.S. Cl.
CPC ...
E04D 1/30 (2013.01); E04D 1/22 (2013.01); E04D 13/002 (2013.01); E04D 2001/308 (2013.01);
Abstract

Some embodiments of the present disclosure relate to a roofing system. In some embodiments, the roofing system comprises at least one steep slope roof substrate having a first region. In some embodiments, the first region comprises a plurality of shingles. In some embodiments, each of the plurality of shingles comprises at least one antimicrobial agent. In some embodiments, the at least one steep slope roof substrate also comprises a second region. In some embodiments, the second region comprises an antimicrobial scavenger layer that is configured to receive runoff from the first region of the steep slope roof substrate. In some embodiments, the runoff comprises an initial concentration of at least one antimicrobial agent and water. In some embodiments, the antimicrobial scavenger layer is configured to capture the at least one antimicrobial agent so as to reduce the initial concentration of the at least one antimicrobial agent in the runoff.


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