Bristol, United Kingdom

Eric Tonnis

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Lam Research Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eric Tonnis. Retrieved from https://idiyas.com/inventor/eric-tonnis-qh7x864q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Eric Tonnis

Introduction

Eric Tonnis is a notable inventor based in Bristol, GB. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the measurement processes associated with semiconductor wafers.

Latest Patents

Eric Tonnis holds a patent for a "Semiconductor wafer mass metrology apparatus and semiconductor wafer mass metrology method." This innovative apparatus includes a measurement chamber designed to measure the weight and/or mass of a semiconductor wafer. It features a first temperature changing part that adjusts the temperature of the semiconductor wafer before it enters the measurement chamber. Additionally, a first temperature sensor is included to monitor the temperature of the wafer during the measurement process.

Career Highlights

Throughout his career, Eric has worked with prominent companies in the semiconductor industry. He has been associated with Lam Research Corporation and Metryx Limited, where he contributed to various projects and advancements in semiconductor technology.

Collaborations

Eric Tonnis has collaborated with several professionals in his field, including his coworker Gregor Elliott. Their joint efforts have furthered the development of innovative solutions in semiconductor metrology.

Conclusion

Eric Tonnis is a distinguished inventor whose work in semiconductor wafer metrology has made a lasting impact on the industry. His patent and career achievements reflect his dedication to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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