Eric T Hansen

Title: Innovations of Eric T Hansen

Introduction

Eric T Hansen is a notable inventor based in Boise, Idaho, recognized for his contributions to the field of semiconductor processing. With a total of four patents to his name, Hansen has made significant advancements in technologies that enhance the efficiency and effectiveness of chemical applications in semiconductor manufacturing.

Latest Patents

Hansen's latest patents include an "Apparatus and method for single substrate processing." This innovative method involves treating a semiconductor substrate by positioning it in a single-substrate process chamber, where it undergoes wet etching, cleaning, and drying steps. The process utilizes turbulence to thin the boundary layer of fluid attached to the substrate, optimizing the cleaning and rinsing performance. Another significant patent is the "Chemical Dispensing system and method," which describes a chemical injection system that allows for precise dispensing of chemicals for various applications. This system includes a chemical storage vessel and a dispense vessel, controlled by a system of valves and sensors to ensure accurate chemical delivery.

Career Highlights

Hansen is currently employed at SCP Global Technologies, Inc., where he continues to innovate and develop new technologies in the semiconductor industry. His work has contributed to advancements that improve manufacturing processes and product quality.

Collaborations

Throughout his career, Hansen has collaborated with notable colleagues, including Victor B Mimken and William Warren Becia. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Eric T Hansen's contributions to semiconductor processing through his patents and collaborative efforts highlight his role as a significant inventor in the field. His work continues to influence the industry and drive advancements in technology.