This inventor holds 1 USPTO granted patent. Top assignee: Vanguard International Semiconductor Corporation. Active years: 1998.
Company Filing History:
Years Active: 1998
Title: The Innovative Contributions of Eric S. Jeng
Introduction
Eric S. Jeng is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of integrated circuit technology. His innovative methods have advanced the way patterned layers are formed within semiconductor devices.
Latest Patents
Eric S. Jeng holds a patent for a method titled "Method for controlling linewidth by etching bottom anti-reflective." This method involves forming a patterned layer within an integrated circuit. The process begins with a substrate that has a blanket target layer. An organic anti-reflective coating (ARC) material is then applied to create a blanket focusing layer. This layer is susceptible to a reproducible negative etch bias during the first etch method. The first etch method utilizes a plasma etch process with a specific reactant gas composition. Following this, a blanket photoresist layer is applied, which is photoexposed and developed to form a patterned photoresist layer. The blanket focusing layer is then etched to create the patterned focusing layer, which serves as a mask for etching the blanket target layer. This innovative method allows for the formation of patterned layers, such as gate electrodes within field effect transistors (FETs), with linewidths as narrow as about 0.25 microns.
Career Highlights
Eric S. Jeng is currently employed at Vanguard International Semiconductor Corporation. His work at this company has been instrumental in pushing the boundaries of semiconductor technology. He has demonstrated a strong commitment to innovation and excellence in his field.
Collaborations
Eric has collaborated with notable colleagues, including Kung Linliu and Hsu-Li Cheng. These partnerships have contributed to the successful development of advanced technologies in the semiconductor industry.
Conclusion
Eric S. Jeng's contributions to the field of integrated circuits through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the semiconductor industry positively.