This inventor holds 1 USPTO granted patent. Top assignee: N K Technology Ltd. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Eric Maiken - Innovator in Thin-Film Process Monitoring
Introduction
Eric Maiken is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of thin-film technology, particularly through his innovative patent that enhances the monitoring of thin-film processes. His work is characterized by a focus on improving the physical properties of thin-film samples.
Latest Patents
Eric Maiken holds a patent titled "Method of monitoring thin-film processes and metrology tool thereof." This invention provides a method for monitoring a modifying process taking place in a thin-film sample, allowing for the characterization of the modified sample. The advantages of this method include its non-intrusive nature, fast (or real-time) response, robust sensitivity, and versatility across various thin-film processes. Notably, this invention allows for the acquisition of an assortment of the "n&k" parameters using a single measurement tool, contrasting with the prior art that required multiple simultaneous measurement tools.
Career Highlights
Eric is associated with N K Technology Ltd, where he applies his expertise in thin-film processes. His innovative approach has positioned him as a key figure in the development of advanced metrology tools.
Collaborations
Throughout his career, Eric has collaborated with esteemed colleagues such as Abdul Rahim Forouhi and Dale A Harrison. These collaborations have further enriched his work and contributed to advancements in the field.
Conclusion
Eric Maiken's contributions to thin-film technology through his innovative patent demonstrate his commitment to enhancing the capabilities of monitoring processes. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
