Eric M Panning

Title: The Innovative Contributions of Eric M Panning

Introduction: Eric M Panning is a notable inventor based in Hillsboro, Oregon, recognized for his significant contributions in the field of extreme ultra-violet (EUV) lithography. With a total of eight patents to his name, Panning's work is at the forefront of modern technological advancements, particularly in the fabrication of process structures that are crucial for semiconductor manufacturing.

Latest Patents: Among Eric M Panning's latest patents are innovative methods for fabricating EUVL process structures. These methods involve several critical steps, including providing a silicon substrate and forming a multi-layer EUVL structure over this substrate. A significant feature of these methods is the reduction of the silicon substrate's thickness after the formation of the multi-layer structure, followed by attaching a low-thermal-expansion material (LTEM) substrate. The detailed design of the multi-layer structure often includes multiple bi-layers of different materials and may comprise a capping layer along with an optional absorber layer to facilitate mask formation for EUVL applications.

Another important patent pertains to an active hardmask for lithographic patterning. In this innovation, energy directed towards the lower surface of a photoresist is redirected back into the material, enhancing the lithographic process's efficiency. This redirection can occur through reflection and/or fluorescence from a hardmask that lies on the wafer surface, which significantly improves the outcomes of the lithographic patterning process.

Career Highlights: Eric M Panning has worked with leading technology firms, notably with Intel Corporation and Sematech, where he contributed to ground-breaking research and development in semiconductor technology. His expertise has led to advancements that support the complex requirements of modern chip manufacturing, showcasing his commitment to innovation in the field.

Collaborations: Throughout his career, Panning has collaborated with esteemed colleagues, including Manish Chandhok and Bryan J. Rice. These partnerships have been instrumental in fostering innovative solutions and pushing the boundaries of what's achievable in lithographic techniques.

Conclusion: Eric M Panning's impressive portfolio of patents and collaborative endeavors highlights his vital role in advancing lithographic technologies. His contributions not only enhance the efficiency of semiconductor manufacturing but also pave the way for future innovations in the field. As technology continues to evolve, the impact of Panning's work is likely to be felt across various applications, solidifying his legacy as a key figure in the innovation landscape.