Company Filing History:
Years Active: 2004-2012
Title: Eric M Gullikson: Innovator in Diffraction Grating and Photolithography
Introduction
Eric M Gullikson is a notable inventor based in Oakland, CA (US). He has made significant contributions to the fields of diffraction grating and photolithography, holding a total of 2 patents.
Latest Patents
Gullikson's latest patents include an innovative ultra-high density diffraction grating. This structure features an echellette substrate with periodically repeating recessed features and a multi-layer stack of materials. The surface of the diffraction grating is planarized, allowing for a periodic arrangement of lines with alternating properties. This design is particularly suitable for extreme ultraviolet (EUV) and soft X-ray applications, with line densities ranging from about 10,000 lines/mm to 100,000 lines/mm. Another significant patent addresses the compensation of flare-induced critical dimension (CD) changes in photolithography. This method effectively eliminates unwanted CD variations in EUV lithography by calculating flare levels and applying mask biasing.
Career Highlights
Throughout his career, Gullikson has worked with prominent organizations, including Euv LLC and the University of California. His work has been instrumental in advancing technologies related to EUV lithography and diffraction gratings.
Collaborations
Gullikson has collaborated with notable individuals in his field, including John Ernst Bjorkholm and Daniel G Stearns. Their collective expertise has contributed to the success of various projects and innovations.
Conclusion
Eric M Gullikson's contributions to the fields of diffraction grating and photolithography highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in his work.