The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Jul. 28, 2009
Howard A. Padmore, Berkeley, CA (US);
Dmytro L. Voronov, El Cerrito, CA (US);
Rossana Cambie, Moraga, CA (US);
Valeriy V. Yashchuk, Richmond, CA (US);
Eric M. Gullikson, Oakland, CA (US);
Howard A. Padmore, Berkeley, CA (US);
Dmytro L. Voronov, El Cerrito, CA (US);
Rossana Cambie, Moraga, CA (US);
Valeriy V. Yashchuk, Richmond, CA (US);
Eric M. Gullikson, Oakland, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A diffraction grating structure having ultra-high density of grooves comprises an echellette substrate having periodically repeating recessed features, and a multi-layer stack of materials disposed on the echellette substrate. The surface of the diffraction grating is planarized, such that layers of the multi-layer stack form a plurality of lines disposed on the planarized surface of the structure in a periodical fashion, wherein lines having a first property alternate with lines having a dissimilar property on the surface of the substrate. For example, in one embodiment, lines comprising high-Z and low-Z materials alternate on the planarized surface providing a structure that is suitable as a diffraction grating for EUV and soft X-rays. In some embodiments, line density of between about 10,000 lines/mm to about 100,000 lines/mm is provided.