River Falls, WI, United States of America

Eric Lee Ottem

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Andersen Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eric Lee Ottem. Retrieved from https://idiyas.com/inventor/eric-lee-ottem

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Eric Lee Ottem and Fenestration Measurement Innovation.

Introduction

Eric Lee Ottem is an inventor based in River Falls, Wisconsin. His patent work includes a system designed to support the measurement of existing windows and other fenestration units for replacement and installation.

Latest Patents

Ottem is associated with 1 patent: “Advanced Measuring Tool for Fenestration Replacements and Installation.” The invention describes a measuring system that uses a solid-object sensor connected to a control circuit to detect physical features of an existing fenestration unit. The system uses those features to measure dimensions and estimate the dimensions needed for a replacement. The patent also describes systems for measuring fenestration-receiving apertures.

Career Highlights

Ottem is associated with Andersen Corporation. His patented work addresses a practical challenge in fenestration replacement: obtaining measurements that can help determine the dimensions required for a new unit.

Collaborations

Jeff Lien is identified as Ottem’s coworker. The available information does not specify their roles or describe a particular joint project.

Conclusion

Eric Lee Ottem’s patent focuses on sensor-assisted measurement for fenestration replacement and installation, connecting his work with Andersen Corporation to a practical application in the window industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…