Eric Davey

Title: Eric Davey: Innovator in Semiconductor Technology

Introduction

Eric Davey is a prominent inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced manufacturing methods and innovative materials that enhance device performance.

Latest Patents

Eric's latest patents include the "Formation of gate all around device" and "Thin plastic polishing article for CMP applications." The first patent describes horizontal gate-all-around devices and methods of manufacturing them. These devices consist of an oxide layer and a semiconductor material layer situated between source and drain regions. The manufacturing method involves growing a conformal epitaxial layer on a nanosheet channel layer, followed by radical plasma oxidation (RPO) to oxidize the layer. An alternative method also includes a surface treatment before the oxidation process. The second patent presents a method and apparatus for polishing substrates using a polymeric sheet with a raised surface texture. This advanced polishing article eliminates the need for abrasive pad conditioning and features micro and macro textures that enhance polishing efficiency.

Career Highlights

Eric Davey is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His innovative work has positioned him as a key player in the development of cutting-edge technologies that drive advancements in semiconductor manufacturing.

Collaborations

Eric collaborates with talented individuals such as Myungsun Kim and Andy Lo, contributing to a dynamic team focused on innovation and excellence in their field.

Conclusion

Eric Davey's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a significant inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing.