This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Amp-Akzo Corporation, Shipley Company LLC. Active years: 1993-2008.
Company Filing History:
Years Active: 1993-2008
Title: Eric C. Huenger: Innovator in Photoresist and Copper Manufacturing
Introduction
Eric C. Huenger is a notable inventor based in Seaford, NY (US). He has made significant contributions to the fields of photoresist compositions and electroless copper manufacturing. With a total of 2 patents, his work has had a considerable impact on the technology used in chip scale packaging and printed wiring boards.
Latest Patents
One of Huenger's latest patents focuses on a plating method that involves photoresist compositions and methods suitable for depositing a very thick photoresist layer in a single coating process. These photoresist layers are particularly beneficial for use in chip scale packaging. Another patent describes an improved method of manufacturing electrolessly deposited copper. This method results in copper deposits that are useful in the manufacture of fully additive and partly additive plated-through hole printed wiring boards. The process involves depositing copper from a bath containing a copper compound, a complexing agent, a reducing agent, a pH-adjusting agent, and one or more addition agents. The improvement for producing highly stress-resistant copper deposits includes controlling various plating bath parameters to ensure that trace iron and/or chromium in the deposited copper is less than 2 mg/mole of copper.
Career Highlights
Throughout his career, Eric Huenger has worked with reputable companies such as Shipley Company LLC and AkzoNobel. His expertise in the field has allowed him to develop innovative solutions that enhance manufacturing processes.
Collaborations
Huenger has collaborated with notable professionals in his field, including Robert S. Forman and Jill E. Steeper. These collaborations have contributed to the advancement of technology in his areas of expertise.
Conclusion
Eric C. Huenger is a distinguished inventor whose work in photoresist and copper manufacturing has led to significant advancements in technology. His contributions continue to influence the industry and pave the way for future innovations.