Eran Chason

Title: Eran Chason: Innovator in Lithography Systems

Introduction

Eran Chason is a notable inventor based in Singapore, SG. He has made significant contributions to the field of lithography systems, particularly in enhancing critical dimension uniformity. With a focus on innovation, Chason has developed a patent that addresses key challenges in wafer-level critical dimension distribution.

Latest Patents

Chason holds a patent titled "Critical dimension uniformity correction by scanner signature control." This invention provides a method to determine the contribution to wafer-level critical dimension distribution from a scanner in a lithography system. By measuring the wafer-level critical dimension uniformity distribution and analyzing the photo mask's light transmission, Chason's patent offers a solution to improve the accuracy of critical dimension distribution.

Career Highlights

Eran Chason is currently employed at Carl Zeiss SMS Ltd., where he continues to work on advancements in lithography technology. His expertise in the field has positioned him as a valuable asset to the company and the industry at large. Chason's innovative approach has led to the development of solutions that enhance the performance of lithography systems.

Collaborations

Chason collaborates with talented professionals in his field, including Ofir Sharoni and Vladimir Dmitriev. These partnerships foster an environment of creativity and innovation, allowing for the exchange of ideas and expertise.

Conclusion

Eran Chason is a distinguished inventor whose work in lithography systems has made a significant impact on the industry. His patent on critical dimension uniformity correction showcases his commitment to innovation and excellence. Through his contributions, Chason continues to advance the field and inspire future developments.