Location History:
- Domodossola-Verbania, IT (2001)
- Agrate Brianza, IT (2004 - 2015)
Company Filing History:
2 out of 5,559 
2 out of 37,950 
Years Active: 2001-2015
Title: Enrico Bellandi: Innovator in Semiconductor Technology
Introduction
Enrico Bellandi is an accomplished inventor based in Agrate Brianza, Italy, recognized for his contributions to the field of semiconductor technology. With a total of four patents to his name, his work primarily focuses on advanced methods of forming metal silicide regions in silicon structures, pivotal for enhancing semiconductor device performance.
Latest Patents
Among Enrico Bellandi's latest innovations are his patents that detail methods for forming metal silicide regions in silicon structures. These patents describe processes where metal materials are applied to dielectric materials and silicon structures, followed by heat exposure to enable multidirectional diffusion of the metal into the silicon. Through these methods, a first metal silicide material is formed and subsequently converted into a second metal silicide material after the removal of unreacted materials. His patents not only cover the methodology but also delve into the creation of semiconductor device fabrics, arrays of silicon structures, and comprehensive semiconductor device structures.
Career Highlights
Enrico has had a distinguished career, having worked at renowned companies such as STMicroelectronics S.r.l. and Micron Technology Incorporated. These roles have allowed him to apply his innovative ideas in practical settings, contributing significantly to advancements in semiconductor technologies.
Collaborations
During his career, Enrico Bellandi has collaborated with notable colleagues, including Carla Maria Lazzari and Simone Alba. These partnerships have facilitated the exchange of ideas and fostered innovation in their respective technological domains, further enhancing the impact of their collective work.
Conclusion
Enrico Bellandi stands out as a key figure in the realm of semiconductor innovation. His patents and contributions to the industry showcase his dedication to advancing technology and developing efficient methods for semiconductor fabrication. As he continues his work, the potential for new breakthroughs in semiconductor technology remains high, promising exciting developments in the future.