Oirschot, Netherlands

Engelbertus Antonius F Van De Pasch


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Engelbertus Antonius F Van De Pasch

Introduction:

Engelbertus Antonius F Van De Pasch, a brilliant inventor hailing from Oirschot, NL, has made significant contributions to the field of lithographic displacement measurement systems. With a patent for an Enhanced Lithographic Displacement Measurement System under his belt, he has revolutionized the way measurements are corrected for atmospheric conditions.

Latest Patents:

Van De Pasch's groundbreaking patent involves the correction of interferometric measurement systems for atmospheric variations like pressure, temperature, and turbulence. By utilizing data from a second harmonic interferometer (SHI) and removing the ramp that represents the SHI data's path length dependence, he has optimized measurement accuracy. The SHI incorporates a passive Q-switched laser as a light source, Brewster prisms in the receiver module, and optical fibers for light conduction. Moreover, a mirror with a specialized coating ensures minimal sensitivity of the SHI data to changes in coating thickness.

Career Highlights:

Engelbertus Antonius F Van De Pasch is currently associated with ASML Netherlands B.V., a leading technology company in the field of lithography and semiconductor equipment. His expertise and innovative spirit have been invaluable in pushing the boundaries of technological advancements in the industry.

Collaborations:

In his journey of innovation, Van De Pasch has collaborated with esteemed professionals in the field. Some of his notable coworkers include Wouter Onno Pril and Robert F Dillon, who have contributed to the success of his projects through their expertise and dedication.

Conclusion:

In conclusion, Engelbertus Antonius F Van De Pasch stands out as a pioneering inventor with a passion for enhancing measurement systems and advancing technological solutions. His patent serves as a testament to his dedication to precision and excellence in the realm of lithography. Van De Pasch's collaborative efforts and innovative approach continue to inspire progress in the industry, setting new benchmarks for future inventions and developments.

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