The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2006
Filed:
Nov. 24, 2003
Wouter Onno Pril, Eindhoven, NL;
Engelbertus Antonius F. Van DE Pasch, Oirschot, NL;
Robert F. Dillon, Stoneham, MA (US);
Philip Dennis Henshaw, Carlisle, MA (US);
Wouter Onno Pril, Eindhoven, NL;
Engelbertus Antonius F. Van De Pasch, Oirschot, NL;
Robert F. Dillon, Stoneham, MA (US);
Philip Dennis Henshaw, Carlisle, MA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.