Burgkirchen, Germany

Engelbert Auer

This inventor holds 1 USPTO granted patent. Top assignee: Siltronic Ag. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Engelbert Auer. Retrieved from https://idiyas.com/inventor/engelbert-auer-svhmmro4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Engelbert Auer: Innovator in Wire Saw Technology

Introduction

Engelbert Auer is a notable inventor based in Burgkirchen, Germany. He has made significant contributions to the field of wire saw technology, particularly with his innovative designs that enhance the efficiency of wafer slicing.

Latest Patents

Auer holds a patent for a wire guide roll specifically designed for wire saws. This invention allows for the simultaneous slicing of multiple wafers from a cylindrical workpiece. The wire guide roll features a coating with a thickness ranging from 2 mm to 7.5 mm, made from a material with a Shore A hardness between 60 and 99. The design includes numerous grooves that guide the sawing wire, each with a curved groove base and a specific radius of curvature, optimizing the slicing process.

Career Highlights

Engelbert Auer is associated with Siltronic AG, a leading company in the semiconductor industry. His work has contributed to advancements in manufacturing processes, particularly in the production of silicon wafers.

Collaborations

Auer has collaborated with notable colleagues such as Anton Huber and Manfred Schoenhofer, who have also played significant roles in the development of innovative technologies within the company.

Conclusion

Engelbert Auer's contributions to wire saw technology exemplify the impact of innovation in the semiconductor industry. His patent for the wire guide roll showcases his commitment to enhancing manufacturing efficiency and precision.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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