En Cih Yang

Title: En Cih Yang: Innovator in Semiconductor Technology

Introduction

En Cih Yang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative approaches to predicting silicon density in metal layers of semiconductor chips. With a total of 2 patents, Yang's work exemplifies the intersection of machine learning and semiconductor design.

Latest Patents

Yang's latest patents focus on methods and systems for predicting silicon density for a metal layer of semiconductor chips via machine learning. The process begins with receiving a specification for a semiconductor chip, which includes a set of photomasks associated with the metal layer. Multiple portions of the metal layer are identified, and respective images are generated based on the photomasks. A drawn density of metal wires for each portion is calculated, and a trained machine learning model is invoked to predict the silicon density of metal wires for each portion. The final silicon density for the area is determined by averaging the predicted silicon densities across the multiple portions.

Career Highlights

En Cih Yang is currently employed at Ansys, Inc., where he continues to develop innovative solutions in semiconductor technology. His expertise in machine learning applications has positioned him as a key player in advancing the capabilities of semiconductor design.

Collaborations

Yang has collaborated with notable colleagues, including Wen-Tze Chuang and Norman H. Chang. These partnerships have fostered a collaborative environment that enhances the innovation process within the semiconductor industry.

Conclusion

En Cih Yang's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work not only advances the technology but also sets a foundation for future innovations in semiconductor design.