Madison, WI, United States of America

Emre Bukusoglu


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Emre Bukusoglu: Innovator in Controlled Release Systems

Introduction

Emre Bukusoglu is a notable inventor based in Madison, Wisconsin. He has made significant contributions to the field of controlled release systems, particularly through his innovative patent. His work focuses on the mechanisms that allow for the precise release of materials trapped in anisotropic fluids.

Latest Patents

Emre Bukusoglu holds a patent titled "Activated release of target material trapped in anisotropic fluids." This patent describes systems and methods for the controlled release of a guest composition that is sequestered within a host composition made up of an anisotropic fluid. The guest composition is immiscible in the host composition, creating an interface where elastic repulsion forces act to prevent the release of the guest composition. The systems and methods disclosed in the patent work by altering the elastic repulsion forces or introducing counter forces to facilitate the release of the guest composition. This technology has potential applications in various fields requiring on-demand delivery of chemical compositions.

Career Highlights

Emre Bukusoglu is associated with the Wisconsin Alumni Research Foundation, where he continues to develop and refine his innovative ideas. His work has garnered attention for its practical applications and scientific significance.

Collaborations

Emre has collaborated with notable colleagues, including Nicholas Lawrence Abbott and Youngki Kim, contributing to advancements in his field through teamwork and shared expertise.

Conclusion

Emre Bukusoglu's contributions to the field of controlled release systems exemplify the impact of innovative thinking in science and technology. His patent reflects a significant advancement in the ability to manage the release of materials, showcasing the potential for future applications.

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