The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Jun. 14, 2017
Applicant:

Wisconsin Alumni Research Foundation, Madison, WI (US);

Inventors:

Nicholas Abbott, Madison, WI (US);

Youngki Kim, Madison, WI (US);

Xiaoguang Wang, Madison, WI (US);

Emre Bukusoglu, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 17/00 (2006.01); B01D 17/02 (2006.01); C09K 19/02 (2006.01); A61K 9/00 (2006.01); A61K 9/107 (2006.01); B01D 17/12 (2006.01);
U.S. Cl.
CPC ...
B01D 17/005 (2013.01); A61K 9/0009 (2013.01); A61K 9/1075 (2013.01); B01D 17/02 (2013.01); B01D 17/12 (2013.01); C09K 19/02 (2013.01);
Abstract

Systems and methods for the controlled release of a guest composition that is sequestered within a host composition made up of an anisotropic fluid are disclosed. The guest composition is immiscible in the host composition, thus forming an interface between the compositions upon which elastic repulsion forces act to prevent the release of the guest composition from the host composition. The disclosed systems and methods work by changing the elastic repulsion forces and/or introducing one or more counter forces such that the elastic repulsion forces are no longer sufficient to prevent release of the guest composition. Exemplary methods include mechanically changing the host material (e.g., changing its temperature) or inducing a chemical (e.g., electrostatic) attraction sufficient to overcome the elastic repulsion forces. The disclosed systems and methods can be used for a variety of applications requiring 'on-demand' delivery of a chemical composition.


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