Gothenburg, Sweden

Elnar O Sveinbjornsson

This inventor holds 1 USPTO granted patent. Top assignee: Nxp B.v.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Elnar O Sveinbjornsson. Retrieved from https://idiyas.com/inventor/elnar-o-sveinbjornsson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Elnar O Sveinbjornsson: Innovator in Semiconductor Technology

Introduction

Elnar O Sveinbjornsson is a notable inventor based in Gothenburg, Sweden. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods to enhance the performance of silicon carbide (SiC) devices. His innovative approach has led to advancements in the manufacturing of semiconductor devices.

Latest Patents

Elnar holds a patent for a "Method for improving inversion layer mobility in a silicon carbide MOSFET." This patent describes a method of manufacturing a semiconductor device based on a SiC substrate. The process involves forming an oxide layer on a Si-terminated face of the SiC substrate at an oxidation rate sufficiently high to achieve a near interface trap density below 5×10 cm. Additionally, the oxidized SiC substrate is annealed in a hydrogen-containing environment to passivate deep traps formed during the oxide-forming step. This method enables the manufacturing of a SiC-based MOSFET with improved inversion layer mobility and reduced threshold voltage. It has been observed that the density of deep traps increases while the density of near interface traps decreases when the Si-face of the SiC substrate undergoes rapid oxidation. The deep traps formed during this process can be effectively passivated by hydrogen annealing, leading to a significantly decreased threshold voltage for the semiconductor device.

Career Highlights

Elnar is currently associated with NXP B.V., a company known for its expertise in semiconductor solutions. His work at NXP has allowed him to focus on innovative technologies that enhance the performance of electronic devices. His contributions have been instrumental in advancing the capabilities of SiC-based devices.

Collaborations

Elnar has collaborated with notable colleagues, including Halldor O Olafsson and Carl F Allerstam. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects within the semiconductor field.

Conclusion

Elnar O Sveinbjornsson is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. His innovative methods for improving SiC devices demonstrate his commitment to enhancing electronic performance. His contributions will continue to influence the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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