This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: The Innovative Contributions of Elizabeth Mao
Introduction
Elizabeth Mao is a prominent inventor based in Sunnyvale, CA. She has made significant contributions to the field of semiconductor technology. With a focus on innovative manufacturing processes, her work has implications for the development of electronic devices.
Latest Patents
Elizabeth holds 1 patent for her invention titled "Radical plasma treatment for semiconductor metal gate stack." This patent describes methods of manufacturing and processing semiconductor devices. The methods include treating a surface of a metal gate stack with a radical treatment. The radical treatment may be used to treat one or more layers or surfaces of layers in the metal gate stack. It involves flowing one or more of nitrogen radicals (N*) and hydrogen radicals (H*) over the surface of the metal gate stack.
Career Highlights
Elizabeth is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work focuses on advancing technologies that enhance the performance and efficiency of electronic devices.
Collaborations
Some of her notable coworkers include Seshadri Ganguli and Zhihui Liu, who contribute to the innovative environment at Applied Materials, Inc.
Conclusion
Elizabeth Mao's contributions to semiconductor technology through her innovative patent demonstrate her expertise and commitment to advancing the field. Her work continues to influence the development of electronic devices, showcasing the importance of innovation in technology.