This inventor holds 1 USPTO granted patent. Top assignee: University of Michigan. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Innovations of Elizabeth Ho Liu in Nanopatterning Technology
Introduction
Elizabeth Ho Liu is an accomplished inventor based in Ann Arbor, MI (US). She has made significant contributions to the field of nanopatterning, which has important applications in various scientific and technological domains. Her innovative approach to creating nanopatterned devices has garnered attention for its potential to enhance the fabrication process over large surface areas.
Latest Patents
Elizabeth Ho Liu holds a patent for a method of nanopatterning by forming cracks in a coated polymer substrate. This patent describes a technique where a multilayer article consisting of a deformable substrate, a brittle layer, and a coating layer is deformed to create a plurality of cracks. These cracks possess different physicochemical properties compared to the non-cracked coating layer, serving as advantageous attachment points for culturing microorganisms. This innovative method simplifies the fabrication of nanopatterned devices, making it more efficient and scalable.
Career Highlights
Elizabeth is affiliated with the University of Michigan, where she continues to advance her research in nanopatterning technologies. Her work has not only contributed to academic knowledge but also has practical implications in various industries, including biotechnology and materials science.
Collaborations
Elizabeth has collaborated with notable colleagues such as Joong Hwan Bahng and Jeongsup Shim. Their combined expertise has further enriched the research and development of nanopatterning techniques.
Conclusion
Elizabeth Ho Liu's innovative work in nanopatterning exemplifies the intersection of creativity and scientific inquiry. Her contributions are paving the way for advancements in the fabrication of nanopatterned devices, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
