Elisa Langhammer

Title: Elisa Langhammer: Innovator in Electroless Copper Plating Solutions

Introduction

Elisa Langhammer is a prominent inventor based in Berlin, Germany. She has made significant contributions to the field of materials science, particularly in the development of innovative plating solutions. Her work has implications for various industries, including electronics and manufacturing.

Latest Patents

Elisa holds a patent for an electroless copper plating solution. This invention relates to an aqueous copper plating solution that includes a source of copper ions, a reducing agent, and a combination of complexing agents. The complexing agents consist of polyamino disuccinic acid, polyamino monosuccinic acid, and other compounds such as ethylenediamine tetraacetic acid. The solution is designed for electroless copper plating, which can be utilized for plating various substrates.

Career Highlights

Elisa is currently employed at Atotech Deutschland GmbH, a company known for its advanced plating solutions and technologies. Her role involves research and development, where she applies her expertise to create innovative products that meet industry needs.

Collaborations

Elisa has collaborated with notable colleagues, including Frank Brüning and Michael Merschky. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Elisa Langhammer's contributions to electroless copper plating solutions exemplify her commitment to innovation in materials science. Her work not only enhances manufacturing processes but also paves the way for future advancements in the field.