Company Filing History:
Years Active: 2006-2007
Title: Eitan Avni: Pioneer in Metal Etching and RF Applications
Introduction
Eitan Avni, an accomplished inventor hailing from Karmiel, Israel, has significantly contributed to the fields of metal etching and radio frequency (RF) applications. With a portfolio of four patents, Avni has demonstrated an impressive ability to innovate and improve existing technologies.
Latest Patents
Among Eitan Avni's latest inventions is a patented method suitable for batch ion etching of copper. This method involves depositing a metal layer on a substrate, applying a photo-resist coating, and using an inert gas plasma for etching at a controlled low temperature. The process concludes with ashing to remove any crust formed during etching, utilizing a specific gas mix comprising CF and O.
In addition, Avni has developed an integrated capacitor designed for RF applications, featuring a Ta adhesion layer. This precision RF passive component encompasses a silicon substrate and multiple layers, including dielectric and metal layers, to optimize performance. Notably, the design allows for additional passivation layers and integrates diffusion barrier layers between metal and dielectric materials to enhance reliability.
Career Highlights
Eitan Avni has gained valuable experience working with notable companies, including Lambda Crossing, Ltd. and Avx Israel, Ltd. His contributions in these roles reflect his commitment to advancing technology in the semiconductor and RF sectors.
Collaborations
Throughout his career, Avni has collaborated with prominent colleagues, including Avi Neta and Moti Margalit. These partnerships have facilitated knowledge exchange and joint efforts in research and development, further amplifying the impact of his innovative contributions.
Conclusion
Eitan Avni stands as a distinguished inventor, showcasing a remarkable ability to devise practical solutions in the highly specialized areas of metal etching and RF technology. His patents not only underline his expertise but also pave the way for future advancements in these fields. Through his work, Avni continues to inspire and contribute to the community of innovators and inventors around the world.