Eiji Suhara

Title: Eiji Suhara: Innovator in Semiconductor Cleaning Technology

Introduction

Eiji Suhara, an inventor based in Ome, Japan, has made significant contributions to the field of semiconductor technology. With one patent to his name, he has developed a method that enhances the cleaning efficiency of semiconductor substrates using innovative approaches.

Latest Patents

Eiji Suhara's noteworthy patent involves a technique on ozone water for use in cleaning semiconductor substrates. This invention details an ultra-pure ozone water that includes an increased amount of an organic carbon. This carbon suppresses the reduction of the half-life period of ozone. The method for producing this ultra-pure ozone water involves adding an organic solvent that contains this organic carbon to a trace amount of ultra-pure ozone water. The enhanced half-life period of ozone in this formulation significantly improves cleaning capabilities against organic and metallic impurities.

Career Highlights

Throughout his career, Eiji Suhara has worked with prominent companies in the semiconductor industry, including Sumitomo Mitsubishi Silicon Corporation and Chlorine Engineers Corp., Ltd. His experiences in these firms have shaped his understanding and development of advanced cleaning technologies for semiconductor applications.

Collaborations

Suhara’s work has been enriched through collaborations with notable colleagues, such as Makoto Takemura and Yasuo Fukuda. These partnerships have contributed to the refinement and execution of his innovative ideas, fostering a collaborative spirit in research and development within the industry.

Conclusion

Eiji Suhara has demonstrated a remarkable ability to innovate within the semiconductor cleaning technology sector through his patented work in ozone water applications. His contributions not only enhance cleaning efficiency but also represent a significant advancement in the processes used to maintain the integrity of semiconductor substrates.