Yokohama, Japan

Eiji Osanai



Average Co-Inventor Count = 1.9

ph-index = 14

Forward Citations = 534(Granted Patents)


Location History:

  • Kanagawa, JP (1989 - 1991)
  • Yokohama, JP (1991 - 2002)

Company Filing History:


Years Active: 1989-2002

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18 patents (USPTO):

Title: Eiji Osanai: Innovator in Exposure Technology

Introduction

Eiji Osanai is a notable inventor based in Yokohama, Japan, who has made significant contributions to the field of exposure technology. With a total of 18 patents to his name, Osanai has been instrumental in advancing precision machinery used in various applications.

Latest Patents

Osanai's latest innovations include two remarkable patents. The first is a "Stage system and exposure apparatus," which features a complex configuration of moving stages designed for precise maneuvering along a reference plane. This apparatus includes a first stage that moves vertically, a second stage moving in an intersecting direction, along with various driving mechanisms to enhance motion efficiency.

The second patent, titled "Positioning system and position measuring method for use in exposure apparatus," describes a positioning system equipped with a movable member that operates along a defined reference plane. This innovative setup incorporates a position measuring device that uses an inclined reflection surface to accurately ascertain the positional information of the movable member.

Career Highlights

Eiji Osanai is currently employed at Canon Kabushiki Kaisha, a leading company known for its cutting-edge imaging and optics technology. His role involves harnessing his inventive skills to develop advanced exposure systems that are critical for high-performance applications in the industry.

Collaborations

Throughout his career, Osanai has collaborated with notable colleagues such as Kotaro Akutsu and Mitsuru Inoue. Their joint efforts have undoubtedly contributed to the successful development of innovative solutions within the realm of exposure technology.

Conclusion

Eiji Osanai's pioneering work and numerous patents highlight his significant influence in the field of exposure apparatus. His ongoing contributions to Canon Kabushiki Kaisha and fruitful collaborations with fellow innovators continue to shape the advancements in this essential area of technology.

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