Canon Kabushiki Kaisha

Eiji Osanai

Kotaro Akutsu

Mitsuru Inoue

Kazunori Iwamoto

Hirohito Ito

Shigeo Sakino

Tadayuki Kubo

Hiroshi Ito

Ryuichi Ebinuma

Kazuya Ono

Hiroaki Takeishi

Mahito Negishi

Shinji Ohishi

Shigeto Kamata

Shin Matsui

Yukio Yamane

Katsumi Asada

Michio Horikoshi

Kotarao Akutsu

A stage system includes a first stage movable along a reference plane, containing a vertical direction, and in the vertical direction or in a first direction close to the vertical direction, a second stage movable in a second direction intersecting with the first direction and relative to the first stage, a first driving mechanism for moving the first stage in the first direction, a second driving mechanism for moving the second stage in the second direction, a countermass movable in the first direction, and a third driving mechanism for moving the countermass in a direction opposite to the first direction.

Stage system and exposure apparatus with the same

A positioning system includes a movable member being movable along a reference plane containing first and second directions, and a position measuring device for measuring positional information related to the movable member, wherein the movable member includes an element having a reflection surface inclined with respect to the reference plane, and wherein the position measuring device includes a measuring system for causing a measurement beam to be reflected by the inclined reflection surface and for detecting positional information related to the movable member with respect to a direction intersecting the reference plane.

Positioning system and position measuring method for use in exposure apparatus

A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

Positioning apparatus and exposure apparatus using the same

A stage feeding device has a movable guide which is guided on a reference surface of a platen to be movable in the Y-direction, a Y-linear motor for moving the movable guide in the Y-direction, a movable stage which is supported by the movable guide to be movable in the X-direction, and carries an object, and an X-linear motor for moving the movable stage in the X-direction. The stator of the X-linear motor is supported by a second stationary guide to be movable in only the Y-direction independently of the movable guide, and is moved in the Y-direction by a driving mechanism. The stator of the Y-linear motor and the second stationary guide are fixed to the base, and mount members for removing vibrations are arranged between the base and the platen.

Stage feeding device

A scanning exposure apparatus wherein a portion of a pattern of an original is projected onto a substrate through a projection optical system and the original and substrate are scanningly moved relative to the projection optical system, whereby the pattern of the original is transferred onto the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting device for supporting the base at three positions, through a damper device and a pillar device. The three positions define an approximately isosceles triangle, and the scan direction is parallel to a straight line that connects a point of intersection of isosceles sides of the triangle and a gravity center thereof.

Exposure apparatus and device manufacturing method using the same

A stage apparatus has a stationary portion, a movable portion and a linear motor for moving the movable portion in a prescribed direction by applying thrust between the stationary and movable portions. A first supporting member supports the stationary portion with a degree of freedom in the direction of movement, and a second supporting member has an axial supporting member for supporting the stationary portion rigidly in the direction of movement and flexibly in other directions. The second supporting member is isolated from the first supporting member in such a manner that vibration will not be transmitted to the first supporting member. The stage is used to scan a master plate in a scanning-type exposure apparatus, and the first supporting member is joined to a lens barrel table on which a projecting optical system is mounted.

Stage and exposure apparatus using same

A stage apparatus is provided with a table having a reference surface, support means for supporting the table, a first movable body movable in a first direction on the reference surface, first driving means for driving the first movable body, a second movable body movable in a second direction differing from the first direction with the first movable body as the reference, and second driving means for driving the second movable body, and the driving reaction forces of the first driving means and the second driving means are received by a base discrete from the table. Also, provision is made of a supporting mechanism for supporting the second driving means for minute displacement in the second direction relative to the first movable body. By this construction, the influence of a reaction force resulting from the acceleration and deceleration of the stage is made small.

Stage apparatus and exposure apparatus and device producing method using

A positioning system wherein a holding surface for holding a substrate is movable relative to a base in directions of X, Y and Z axes and in rotational directions about the X, Y and Z axes, wherein there are plural guiding devices associated respectively with motions in the directions of X, Y and Z axes and in the rotational directions about the X, Y and Z axes, respectively, and wherein each guiding device comprises a non-contact static bearing device.

Positioning system and method and apparatus for device manufacture

A stage apparatus and method of mounting a substrate on a substrate holding surface of a substrate chuck in which a substrate is mounted in a Z-axis direction. The stage apparatus includes a movable stage, which is movable on an X-Y plane, a substrate stage mounted on the movable stage to be movable at least in a Z-axis direction, a substrate chuck which is arranged on the substrate stage for holding a substrate and a substrate support device, which is brought into contact with the substrate on the chuck and receives the substrate when the substrate stage moves in the Z-axis direction. The substrate support device includes a substrate supporting number arranged on the movable stage and the substrate stage has an opening through which the substrate supporting member can pass. A contact surface of the substrate chuck is located above a substrate contact surface of the substrate supporting member upon movement of the substrate stage. The substrate stage is lowered in the Z-axis direction and the substrate held by the substrate chuck is transferred from the substrate chuck onto the substrate supporting member in the process of moving the substrate stage.

Stage apparatus and method of mounting a substrate on a substrate

A weight supporting apparatus supports the weight of a structure required to have very high surface precision, without affecting the surface precision of the structure. The weight support apparatus includes a driving unit for moving a driven body in the direction of gravity with respect to a base, and a supporting unit for supporting the weight of the driven body at a position after being driven, wherein the driving unit and supporting unit are so arranged that the drive force of the driving unit and the support force of the supporting unit are on the same axis.

Weight supporting apparatus

An exposure apparatus includes an exposure optical system, a stage on which an article to be exposed is to be placed, a moving mechanism for moving the stage relative to the exposure optical system, a first base for supporting the moving mechanism, a main base for supporting the exposure optical system, on which main base the first base is mounted, a first supporting portion being interposed between the first base and the main base, a second base for supporting the main base, a vibration removing device being interposed between the main base and the second base, and a second supporting portion being interposed between the first base and the second base.

Exposure apparatus including an antivibration control system

A base board supported on an X-Y stage or the like of an exposure apparatus includes a cylindrical fixed member. Porous pads held on the fixed member support the inner circumferential surface of a guide member provided as one body with a holding member for holding a wafer in a non-contact state. The base board is rotated around its central axis by a .theta. linear motor, and is reciprocated in the vertical direction by Z linear motors provided at an equal interval in the circumferential direction. Each of the Z linear motors and the .theta. linear motor includes a rotor fixed to the holding board, and a stator that includes a coil fixed to the base board.

Positioning apparatus including a hydrostatic bearing for spacing apart

A parallel-moving apparatus includes a fixed table with a static pressure bearing pad, and a movable table with an inclined static pressure bearing pad. A driving plate having a wedge-shaped cross-section is disposed between the fixed table and the movable table, and both surfaces thereof are parallel to the static pressure bearing pad of the movable table and the static pressure bearing pad of the fixed table, and are noncontact-supported thereby. When the driving plate is moved by an actuator, the movable table is moved toward or away from the fixed table while keeping its parallelism to the fixed table.

Parallel-moving apparatus and lens moving device in an exposing

A positioning device, includes a first positioning portion for moving an article in a direction substantially perpendicular to a predetermined plane and/or in a direction inclined with respect to the predetermined plane; a second positioning portion for moving the article in a direction substantially parallel to the predetermined plane, wherein the first positioning portion is mounted on the second positioning portion; a base member on which the second positioning portion is mounted; and a position detecting system for controlling movement of the article through the first positioning portion, the position detecting system being operable to measure displacement with respect to the surface of the base member.

Positioning mechanism

A motion guiding device includes a first movable member movable in a first direction, a second movable member movable in a second direction different from the first direction and for guiding motion of the first movable member in the first direction through a gas pressure, a base for supporting the first and second movable members independently of each other, with respect to a vertical direction through cooperation of a gas pressure. In addition, a guide is fixed to the base for guiding motion of the second movable member in the second direction through cooperation of a gas pressure and a magnetic force of a permanent magnet, a first linear motor moves the first movable member in the first direction, relative to the second movable member, and a second linear motor moves the second movable member with the first movable member in the second direction.

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Yokohama, Japan

Eiji Osanai