Eiji Oi

Title: Eiji Oi - Innovator in Semiconductor Technology

Introduction

Eiji Oi is a notable inventor based in Kawagoe, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of integrated circuit devices. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.

Latest Patents

Eiji Oi holds a patent for a semiconductor integrated circuit device. This invention pertains to a CMOS gate array, where each bonding pad corresponding to input cells for signals and supply voltages is formed of multiple conductor layers. In contrast, the bonding pads for input/output cells that are not utilized are formed from the uppermost conductor layer. This design results in a greater thickness of the underlying insulator film and increased spacing from the semiconductor substrate for the non-connected pads compared to the pads for signals and supply voltages.

Career Highlights

Eiji Oi is associated with Hitachi, Ltd., a leading company in the technology sector. His work at Hitachi has allowed him to engage in cutting-edge research and development, contributing to advancements in semiconductor technology. His patent reflects his commitment to innovation and excellence in his field.

Collaborations

Eiji Oi has collaborated with notable colleagues, including Takayuki Noto and Yahiro Shiotsuki. These collaborations have fostered a creative environment that encourages the exchange of ideas and expertise, further enhancing the quality of their work.

Conclusion

Eiji Oi's contributions to semiconductor technology through his patent and work at Hitachi, Ltd. highlight his role as an influential inventor. His innovative designs continue to impact the field, showcasing the importance of creativity and collaboration in technological advancements.