Location History:
- Kyoto, JP (1984 - 1985)
- Higashi-Osaka, JP (1987 - 1989)
Company Filing History:
Years Active: 1984-1989
Title: Eiji Kodama: Innovator in Pattern Inspection Technology
Introduction
Eiji Kodama is a prominent inventor based in Kyoto, Japan, known for his significant contributions to the field of pattern inspection technology. With a total of five patents to his name, Kodama has developed innovative methods and systems that enhance the accuracy of defect detection in various applications.
Latest Patents
Kodama's latest patents include a "Method of and apparatus for detecting pattern defects." This invention expands the periphery of a master pattern area by a required number of pixels, allowing for a detailed comparison between master pattern areas and an object pattern. The system determines if the object pattern is defective based on the results of these comparisons, ensuring high accuracy even in the presence of misregistration errors. Another notable patent is the "System for inspecting pattern defects of printed wiring boards." This system utilizes previously formed marks on printed wiring boards (PWBs) to detect deviations and perform image acquisition for inspection. By comparing binary image data from multiple PWBs, the system effectively identifies differences in patterns, enhancing the reliability of inspections.
Career Highlights
Eiji Kodama has worked with notable companies such as Dainippon Screen Manufacturing Co., Ltd. and Dainippon Screen Seizo Kabushiki-kaisha. His experience in these organizations has allowed him to refine his expertise in pattern inspection technologies and contribute to advancements in the field.
Collaborations
Kodama has collaborated with esteemed colleagues, including Tetsuo Sano and Hisayuki Tsujinaka. Their combined efforts have further propelled innovations in pattern inspection and defect detection.
Conclusion
Eiji Kodama's work in pattern inspection technology has made a significant impact on the industry. His innovative patents and collaborations highlight his dedication to improving accuracy in defect detection. His contributions continue to influence advancements in this critical field.
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