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For the Inventor, By the Inventor

Utsunomiya, Japan

Eiji Hayakawa

This inventor holds 17 USPTO granted patents and 3 published patent applications and 5 EPO patents. Top assignees: Eastman-Kodak Company, Kodak Polychrome Graphics, Gmbh, Dainippon Ink and Chemicals, Incorporated. Active years: 1998-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiji Hayakawa. Retrieved from https://idiyas.com/inventor/eiji-hayakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 35.3


Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 45(Granted Patents)


Location History:

  • Tochigi-ken, JP (2005)
  • Utsunomiya, JP (1998 - 2016)

Company Filing History:

goldMedal9 out of 21,604 
 
Eastman-Kodak Company
 patents
silverMedal5 out of 295 
 
Kodak Polychrome Graphics, Gmbh
 patents
bronzeMedal1 out of 630 
 
Dainippon Ink and Chemicals, Incorporated
 patents
4. 1 out of 1 
 
Kodak Japan Ltd. and Nec Engineering Ltd.
 patent
5. 1 out of 834,513 
Other
 patents

Years Active: 1998-2016

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17 patents (USPTO):Explore Patents
1. 9366962 - Negative-working lithographic printing plate precursor and use (2016-06-14),
2. 9250521 - Lithographic printing plate precursor and a method for making a printing plate (2016-02-02),
3. 8835099 - Lithographic printing plate precursor (2014-09-16),
4. 8383319 - Lithographic printing plate precursors and stacks (2013-02-26),
5. 8119326 - Lithographic-printing plate precursor and image forming method using the same (2012-02-21),
6. 7883830 - Photosensitive planographic printing plate (2011-02-08),
7. 7807333 - Method and apparatus for development of lithographic printing plate precursor (2010-10-05),
8. 7291438 - Negative photosensitive composition and negative photosensitive lithographic printing plate (2007-11-06),
9. 7097956 - Imageable element containing silicate-coated polymer particle (2006-08-29),
10. 7056639 - Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid (2006-06-06),
11. 6921620 - Imageable composition containing colorant having a counter anion derived from a non-volatile acid (2005-07-26),
12. 6902860 - Two-layer imageable element comprising thermally reversible polymers (2005-06-07),
13. 6808857 - Negative-working photosensitive composition and negative-working photosensitive lithographic printing plate (2004-10-26),
14. 6627380 - Photosensitive composition, original plate using the same for lithographic printing, and method for producing images on original plate (2003-09-30),
15. 6514657 - Photosensitive composition for lithographic printing plate and photosensitive lithographic printing plate (2003-02-04),

Title: Eiji Hayakawa: Pioneering Inventor from Utsunomiya

Introduction: Eiji Hayakawa is a renowned inventor hailing from Utsunomiya, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hayakawa's latest patents include advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over three decades, Eiji Hayakawa has worked with leading tech companies and research institutions, consistently delivering innovative solutions that have revolutionized various industries.

Collaborations: Throughout his career, Hayakawa has collaborated with top engineers, scientists, and researchers globally, fostering a culture of innovation and knowledge sharing that has led to numerous successful projects and inventions.

Conclusion: Eiji Hayakawa's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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