Company Filing History:
Years Active: 2016
Title: Eiichirou Shinpuku: Innovator in Etching Technology
Introduction
Eiichirou Shinpuku is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in etching technology. His innovative approach has led to advancements that enhance the efficiency and precision of etching processes.
Latest Patents
Shinpuku holds a patent for an etching method and apparatus. This invention focuses on etching a silicon oxide film selectively with respect to a silicon nitride film formed on a substrate. The method involves introducing a processing gas containing a plasma excitation gas and a CHF-based gas into a processing chamber. The flow rate ratio of the CHF-based gas to the plasma excitation gas is maintained at 1/15 or higher. By generating plasma in the processing chamber, the silicon oxide film is etched selectively, which is crucial for semiconductor applications. He has 1 patent to his name.
Career Highlights
Eiichirou Shinpuku is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has allowed him to develop and refine his etching techniques, contributing to the advancement of semiconductor manufacturing processes.
Collaborations
Shinpuku has collaborated with notable colleagues, including Takayuki Sekine and Masaru Sasaki. Their combined expertise has fostered an environment of innovation and has led to significant advancements in their field.
Conclusion
Eiichirou Shinpuku's contributions to etching technology have made a lasting impact on the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in manufacturing processes.