Machida, Japan

Eiichi Toji


Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1989-1990

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3 patents (USPTO):Explore Patents

Title: Eiichi Toji - Pioneering Innovations in Silicon Crystal Technology

Introduction

Eiichi Toji is a distinguished inventor based in Machida, Japan, known for his significant contributions to the field of silicon crystal technology. With three patents to his name, his work particularly focuses on improving methods of silicon wafer production and single crystal growth, which are crucial for advancements in electronics and semiconductor industries.

Latest Patents

Toji's latest patents demonstrate his innovative approach to silicon wafer fabrication. One notable patent is for a method called "Neutron transmutation doping of a silicon wafer." This invention involves a phosphor-doping technique, where phosphor is incorporated into single silicon crystals by transmuting the isotope Si-30 contained in those crystals into P-31 through neutron irradiation. This process enhances the electrical properties of silicon wafers, making them more efficient for use in various electronic applications.

Another significant invention is a "Method of and device for growing single crystals," which describes a device that utilizes a pair of electromagnetic coils positioned symmetrically regarding the central axis of a crucible, located outside of a heater. The design allows for optimal control during the growth process, significantly improving the quality and efficiency of single crystal production.

Career Highlights

Eiichi Toji's career is marked by his role at Toshiba Ceramics Co., Ltd., where he applies his expertise in material science to develop advanced technologies. His innovative work has not only contributed to the company’s growth but has also impacted the broader field of semiconductor manufacturing.

Collaborations

Throughout his career, Toji has collaborated with esteemed colleagues, including Shin'ichiro Takasu and Michihiro Ohwa. Their collective efforts have facilitated groundbreaking research and development within the field, pushing the boundaries of what is possible in silicon wafer technology.

Conclusion

Eiichi Toji exemplifies the spirit of innovation through his patents and collaborative efforts in the field of silicon crystal technology. His contributions continue to influence the semiconductor industry, paving the way for future advancements in electronics and materials science.

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