Toshiba Ceramics Co., Ltd.

Eiichi Toji

Kazumoto Homma

Shin'ichiro Takasu

Michihiro Ohwa

Kazuhiko Kashima

A silicon wafer and a method of producing a silicon wafer comprising a phosphor-doping method of doping phosphor into a single silicon crystals by transmuting isotope Si.sup.30 contained in said single silicon crystals made by the CZ method or the MCZ method into p.sup.31 under neutron irradiation to said single silicon crystals.

Neutron transmutation doping of a silicon wafer

A device for growing single cristals comprising a pair of electromagnetic coils disposed opposed to each other in a symmetry with respect to a central axis of a crucible at an outer side of a heater, an effective average radius of said coil being from 1.5 to 5 times of a radius of said crucible.

Method of and device for growing single crystals

A device for growing single crystals comprising a pair of electromagnetic coils disposed opposed to each other in a symmetry with respect to a central axis of a crucible at an outer side of a heater, a diameter for said coils being greater than 0.8 times of a diameter for said heater and a distance between said coils being greater than 1.5 times of said diameter for said heater.

Growing community of inventors

Machida, Japan

Eiichi Toji