Eiichi Sekimoto is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate processing technology. With a total of 12 patents to his name, Sekimoto has made remarkable advancements in the field, particularly in the design and functionality of substrate processing apparatuses.

Latest Patents

Among his latest innovations, Sekimoto has developed a substrate processing apparatus that features a substrate holding and rotating part, which is designed to hold a substrate on a mounting table while allowing it to rotate. This apparatus includes a laser irradiation head that directs a laser beam toward the lower surface of the mounting table. The controller of the apparatus manages both the rotation of the substrate and the laser beam irradiation, ensuring precise processing. Another notable patent involves a substrate processing apparatus with multiple heating modules, each equipped with independent heaters for various heated zones of the substrate. This design allows for controlled heat generation, ensuring uniform temperature profiles across the substrate during processing.

Career Highlights

Eiichi Sekimoto is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has significantly impacted the efficiency and effectiveness of substrate processing, making him a key figure in the field.

Collaborations

Sekimoto has collaborated with notable colleagues, including Masatoshi Deguchi and Takeshi Saikusa, contributing to the advancement of technology in substrate processing.

Conclusion

Eiichi Sekimoto's innovative work in substrate processing technology has led to numerous patents that enhance the capabilities of manufacturing processes. His contributions continue to influence the industry and pave the way for future advancements.

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