Kyoto, Japan

Eiichi Nakaoka

This inventor holds 2 USPTO granted patents. Top assignee: Shimadzu Seisakusho Ltd.. Active years: 1976.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiichi Nakaoka. Retrieved from https://idiyas.com/inventor/eiichi-nakaoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1976

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2 patents (USPTO):Explore Patents

Title: The Innovations of Eiichi Nakaoka

Introduction

Eiichi Nakaoka is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of flaw detection and elimination in manufacturing processes. With a total of two patents to his name, Nakaoka's work has had a considerable impact on the industry.

Latest Patents

Nakaoka's latest patents include an "Apparatus for automatically detecting and eliminating flaws on slabs or billets." This innovative device comprises a single flaw detector that successively scans the surfaces of objects to produce detection signals corresponding to the flaws detected. It features multiple storage units that separately store the detection signals obtained from scanning each object. Additionally, the apparatus includes several flaw eliminators, each responsible for scanning the surface of a transferred object to eliminate flaws based on the stored detection signals. Another patent involves a similar apparatus that integrates a flaw detector and a grinder mounted on a common carriage. This design allows the detector to scan the surface of the slab or billet while the grinder follows closely behind, ready to eliminate any detected flaws.

Career Highlights

Eiichi Nakaoka is associated with Shimadzu Seisakusho Ltd., a company known for its advanced technological solutions. His work at Shimadzu has allowed him to focus on developing innovative solutions for flaw detection and elimination, enhancing manufacturing efficiency and product quality.

Collaborations

Nakaoka has collaborated with notable coworkers, including Takeharu Maekawa and Masahide Tokunaga. Their combined expertise has contributed to the successful development of Nakaoka's patented technologies.

Conclusion

Eiichi Nakaoka's contributions to the field of flaw detection and elimination demonstrate his innovative spirit and commitment to advancing manufacturing technology. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions to enhance product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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