Kanagawa, Japan

Eiichi Kashiwagi


Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 44(Granted Patents)


Location History:

  • Kawasaki, JP (1989)
  • Kanagawa, JP (1989 - 1990)

Company Filing History:


Years Active: 1989-1990

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3 patents (USPTO):Explore Patents

Title: Eiichi Kashiwagi: Innovator in Silica-Based Film Technology

Introduction

Eiichi Kashiwagi is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of silica-based films, holding a total of 3 patents. His innovative approaches have enhanced the quality and performance of various coating solutions.

Latest Patents

Kashiwagi's latest patents include a method for improving the film quality of silica-based films. This method involves applying a coating solution with a specific viscosity onto a substrate, such as a silicon wafer. The coated solution is then dried to form a silica-based film, which is exposed to ultraviolet radiation in an ozone-rich atmosphere. This process can be conducted at room temperature or at temperatures not exceeding 300°C, particularly between 50°C and 200°C. The exposure to ultraviolet radiation significantly enhances the film quality of the silica-based film.

Another notable patent focuses on the surface treatment of silicone-based coating films. This invention improves the adhesiveness of a silicone-based coating film to an overcoating layer, such as a photoresist layer. By subjecting the silicone-based coating film to plasma treatment at temperatures of 120°C or below in an oxygen-rich atmosphere, cracks can be avoided. This technique is also applicable in the patterning of silicone-based coating films, which involves several steps, including the formation of a photoresist layer and selective etching.

Career Highlights

Eiichi Kashiwagi is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products and materials for the semiconductor industry. His work has been instrumental in developing innovative solutions that address the challenges faced in film quality and adhesion.

Collaborations

Kashiwagi has collaborated with notable colleagues, including Muneo Nakayama and Toshihiro Nishimura. Their combined expertise has contributed to the success of various projects and innovations in the field.

Conclusion

Eiichi Kashiwagi's contributions to silica-based film technology exemplify the impact of innovative thinking in the field of materials science. His patents reflect a commitment to enhancing film quality and adhesion, paving the way for advancements in semiconductor applications.

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