The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 1990
Filed:
May. 20, 1988
Muneo Nakayama, Tokyo, JP;
Akira Hashimoto, Kanagawa, JP;
Toshihiro Nishimura, Kanagawa, JP;
Eiichi Kashiwagi, Kanagawa, JP;
Isamu Hijikata, Kanagawa, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
A coating solution for forming a silica-based film, having a given viscosity, is coated on a substrate such as a silicon wafer, this coating solution is dried to form a silica-based film, and this silica-based film is exposed to ultraviolet radiation in an atmosphere containing ozone at room temperature or while heating it preferably at a temperature of not more than 300.degree. C., particularly at a temperature of from 50.degree. to 200.degree. C., by means of a heating member such as a hot plate. The film quality of the silica-based film can be improved by exposing it to ultraviolet radiation in the atmosphere containing ozone.