This inventor holds 1 USPTO granted patent. Top assignee: W.c. Heraeus Gmbh & Co Kg. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Egon Maier: Innovator in Cathode Sputtering Technology
Introduction
Egon Maier is a notable inventor based in Hasselroth, Germany. He has made significant contributions to the field of cathode sputtering technology. His innovative approach has led to the development of a unique process for producing tube-shaped cathode sputtering targets.
Latest Patents
Egon Maier holds a patent for a "Process for producing a tube-shaped cathode sputtering target." This process involves creating a tube target from a metallic inner tube made of a first material with a melting point of T ≥ 900 K. The outer tube, which surrounds the inner tube, is made of a second material with a melting point of T ≤ 800 K. The design ensures that the two tubes fit tightly together and are mechanically joined. The outer tube is formed by casting the second material in a molten state within a heated, vertical, cylindrical permanent mold.
Career Highlights
Egon Maier is associated with W.C. Heraeus GmbH & Co. KG, a company known for its advancements in materials technology. His work has been instrumental in enhancing the efficiency and effectiveness of cathode sputtering plants.
Collaborations
Egon has collaborated with notable coworkers, including Ralf Heck and Rainer Jüttner. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Egon Maier's innovative contributions to cathode sputtering technology exemplify the impact of dedicated inventors in advancing industrial processes. His patent and work at W.C. Heraeus GmbH & Co. KG highlight the importance of innovation in the field.