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For the Inventor, By the Inventor

Eindhoven, Netherlands

Egbert Lenderink

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 4.1

ph-index = 5

Forward Citations = 50(Granted Patents)


Location History:

  • Eindhoven, NL (2003 - 2017)
  • Waalre, NL (2008 - 2023)

Company Filing History:

goldMedal17 out of 21,361 
 
Koninklijke Philips Corporation N.v.
 patents
silverMedal5 out of 4,883 
 
Asml Netherlands B.v.
 patents
bronzeMedal1 out of 1,788 
 
Signify Holding B.v.
 patents
4. 1 out of 853 
 
Philips Lighting Holding B.v.
 patents
where one patent can have more than one assignee

Years Active: 2003-2025

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23 patents (USPTO):
1. 12474629 - Membrane for EUV lithography (2025-11-18),
2. 11762281 - Membrane for EUV lithography (2023-09-19),
3. 11561478 - Determining subset of components of an optical characteristic of patterning apparatus (2023-01-24),
4. 10908496 - Membrane for EUV lithography (2021-02-02),
5. 10288227 - Dimable light emitting arrangement (2019-05-14),
6. 9743521 - Light-source module and light-emitting device (2017-08-22),
7. 8922121 - Lighting system, electrode device and light source (2014-12-30),
8. 8531111 - Light module (2013-09-10),
9. 8465183 - Lighting device and method for manufacturing same (2013-06-18),
10. 8414141 - Luminaire for illuminating a space underneath a ceiling or a canopy, and method of illuminating such a space (2013-04-09),
11. 8414138 - Illumination device (2013-04-09),
12. 8410500 - Light-emitting apparatus with shaped wavelength converter (2013-04-02),
13. 8356902 - Ambient lighting for an image display (2013-01-22),
14. 8128267 - Light source and illumination device comprising at least one light-emitting element (2012-03-06),
15. 8086082 - Methods for mounting an electro-optical component in alignment with an optical element and related structures (2011-12-27),

Title: Egbert Lenderink: Innovator in EUV Lithography

Introduction:

Egbert Lenderink, a prolific inventor based in Eindhoven, Netherlands, has made significant contributions to the field of EUV lithography with a remarkable portfolio of 22 patents.

Latest Patents:

Among his latest patents is the groundbreaking "Membrane for EUV lithography," which introduces advanced membranes for EUV lithography processes. These membranes feature a unique stack design with specific metal oxides and compounds, enhancing the efficiency and precision of lithography processes. Additionally, Lenderink's patent on determining subsets of components of an optical characteristic of a patterning apparatus revolutionizes the way optical characteristics are analyzed and optimized in the patterning industry.

Career Highlights:

With a background working at prestigious companies like Koninklijke Philips Corporation N.V. and ASML Netherlands B.V., Egbert Lenderink has honed his expertise in cutting-edge technologies and innovations. His keen insights and inventive spirit have driven advancements in EUV lithography and beyond.

Collaborations:

Throughout his career, Egbert Lenderink has collaborated closely with industry experts and innovators. Noteworthy colleagues include Robert Frans Maria Hendriks and Joseph Ludovicus Antonius Maria Sormani, who have contributed to the success of joint projects and inventions in the field.

Conclusion:

Egbert Lenderink stands out as a visionary inventor in the realm of EUV lithography, with a proven track record of pioneering patents and collaborations that push the boundaries of technological innovation. His innovative solutions have paved the way for advancements in lithography processes, setting new standards for the industry.

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