This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Edward T Xia: Inventor in Semiconductor Processing.
Introduction
Edward T Xia is an inventor based in Santa Clara, California. His patent work concerns semiconductor processing, particularly reducing impurities during radical treatment of metal-layer substrates.
Latest Patents
Xia is associated with 1 patent: “Higher Pressure Purge for Impurity Reduction in Radical Treatment Chamber.” The patent describes a post-deposition method that preheats a substrate bearing a metal layer in a radical treatment chamber. During preheating, purge gas is introduced and removed at a pressure between 400 and 535 Torr. The substrate is then exposed to radical species in a radical treatment process.
Career Highlights
Xia is associated with Applied Materials, Inc., a company involved in semiconductor manufacturing technologies. His patent reflects work on chamber processing conditions intended to reduce impurities during treatment.
Collaborations
The provided information identifies Pradeep Sampath Kumar and Norman L Tam as Xia’s coworkers. Their shared association with Applied Materials, Inc. places them within the same professional environment, though no specific joint patent work is indicated.
Conclusion
Edward T Xia’s patent focuses on a higher-pressure purge step designed to support impurity reduction in semiconductor radical treatment chambers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile